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General Introduction
Fused Silica is formed by chemical combination of silicon and oxygen. Fused Silica is perfect optical material due to its good UV and IR transmission, low coefficient of thermal expansion. It has high stability and resistance to thermal shock over large temperature excursions, wide temperature operating range and high laser damage threshold.
Manufacturing Process
High Temperatuer Fusion----Cooling----Smashing----Cooling-----Selecting
Characteristic
1.low linear coefficient
2.low stress
3.low radioactivity
Physical & Chemical analysis
1.From the appearance,we can see Fused Silica is transparent block,grain,or white powder
2.Mosh hardness 7.0
3.PH 6.0
4.Sio2 99.9%-99.95% Fe2O3 10PPM-25PPM max Li2O 1-2PPM MAX Al2O3 20-30ppm max K2O 20-25PPM MAX Na2O 10-20PPM MAX
99.9% High purity Fused Silica
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